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| A63.7080, A63.7081 Software Main Function | ||
| High voltage integrated commissioning | Automatic filament on / off | Potential shift regulation |
| Brightness adjustment | Electric to central adjustment | Automatic brightness |
| Contrast adjustment | Objective lens adjustment | Auto focus |
| Magnification adjustment | Objective degaussing | Automatic astigmatism elimination |
| Selected area scanning mode | Electric rotation adjustment | Management of microscope parameters |
| Point scanning mode | Electron beam displacement adjustment | Real time display of scanning field size |
| Line scanning mode | Electron beam tilt adjustment | Gun lens adjustment |
| Surface scanning | Scanning speed adjustment | Multichannel input |
| High voltage power monitoring | Swing centering | Ruler measurement |
| SEM | A63.7069 & A63.7069-LV | A63.7080 & A63.7080-L & A63.7080-M | A63.7081 |
| Resolution | 3nm@30KV(SE) 6nm@30KV(BSE) | 1.5nm@30KV(SE) 3nm@30KV(BSE) | 1.0nm@30KV(SE) 3.0nm@1KV(SE) 2.5nm@30KV(BSE) |
| Magnification | 8x~300000x Negative True Magnification | 8x~800000x Negative True Magnification | 6x~1000000x Negative True Magnification |
| Electron Gun | Pre-Centered Tungsten Filament Cartridge | Schottky Field Emission Gun | Schottky Field Emission Gun |
| Voltage | Accelerating Voltage 0~30KV, Continuous Adjustable, Adjust Step 100V@0-10Kv, 1KV@10-30KV | ||
| Quick View | One Key Quick View Image Function | N/A | N/A |
| Lens System | Three-levels Electromagnetic Tapered Lens | Multi-levels Electromagnetic Tapered Lens | |
| Aperture | 3 Molybdenum Objective Apertures, Adjustable Outside Of Vacuum System, No Need Disassemble Objective To Change Aperture | ||
| Vacuum System | 1 Turbo Molecular Pump 1 Mechanical Pump Sample Room Vacuum>2.6E-3Pa Electron Gun Room Vacuum>2.6E-3Pa Fully Auto Vacuum Control Vacuum Interlock Function Optional Model: A63.7069-LV 1 Turbo Molecular Pump 2 Mechanical Pumps Sample Room Vacuum>2.6E-3Pa Electron Gun Room Vacuum>2.6E-3Pa Fully Auto Vacuum Control Vacuum Interlock Function Low Vacuum Range 10~270Pa For Quick Switch in 90 Seconds For BSE(LV) | 1 Ion Pump Set 1 Turbo Molecular Pump 1 Mechanical Pump Sample Room Vacuum>6E-4Pa Electron Gun Room Vacuum>2E-7 Pa Fully Auto Vacuum Control Vacuum Interlock Function | 1 Sputter Ion Pump 1 Getter Ion Compound Pump 1 Turbo Molecular Pump 1 Mechanical Pump Sample Room Vacuum>6E-4Pa Electron Gun Room Vacuum>2E-7 Pa Fully Auto Vacuum Control Vacuum Interlock Function |
| Detector | SE: High Vacuum Secondary Electron Detector (With Detector Protection) | SE: High Vacuum Secondary Electron Detector (With Detector Protection) | SE: High Vacuum Secondary Electron Detector (With Detector Protection) |
| BSE: Semiconductor 4 Segmentation Back Scattering Detector | Optional | Optional | |
| Optional Model: A63.7069-LV BSE(LV): Semiconductor 4 Segmentation Back Scattering Detector | |||
| CCD:Infrared CCD Camera | CCD:Infrared CCD Camera | CCD:Infrared CCD Camera | |
| Extend Port | 2 Extend Ports On Sample Room For EDS, BSD, WDS etc. | 4 Extend Ports On Sample Room For BSE, EDS, BSD, WDS etc. | 4 Extend Ports On Sample Room For BSE, EDS, BSD, WDS etc. |
| Specimen Stage | 5 Axes Stage, 4 Auto+1ManualControl Travel Range: X=70mm, Y=50mm, Z=45mm, R=360°, T=-5°~+90°(Manual) Touch Alert & Stop Function | 5 Axes AutoMiddleStage Travel Range: X=80mm, Y=50mm, Z=30mm, R=360°, T=-5°~+70° Touch Alert & Stop Function Optional Model: A63.7080-M 5 Axes ManualStage A63.7080-L 5 Axes AutoLargeStage | 5 Axes AutoLargeStage Travel Range: X=150mm, Y=150mm, Z=60mm, R=360°, T=-5°~+70° Touch Alert & Stop Function |
| Max Specimen | Dia.175mm, Height 35mm | Dia.175mm, Height 20mm | Dia.340mm, Height 50mm |
| Image System | Real Still Image Max Resolution 4096x4096 Pixels, Image File Format: BMP(Default), GIF, JPG, PNG, TIF | Real Still Image Max Resolution 16384x16384 Pixels, Image File Format: TIF(Default), BMP, GIF, JPG, PNG Video: Auto Record Digital .AVI Video | Real Still Image Max Resolution 16384x16384 Pixels, Image File Format: TIF(Default), BMP, GIF, JPG, PNG Video: Auto Record Digital .AVI Video |
| Computer & Software | PC Work Station Win 10 System, With Professional Image Analysis Software To Fully Control Whole SEM Microscope Operation, Computer Specification No Less Than Inter I5 3.2GHz, 4G Memory, 24"IPS LCD Monitor, 500G Hard Disk, Mouse, Keyboard | ||
| Photo Display | The Image Level Is Rich And Meticulous, Showing Real Time Magnification, Ruler, Voltage, Gray Curve | ||
| Dimension & Weight | Microscope Body 800x800x1850mm Working Table 1340x850x740mm Total Weight 400Kg | Microscope Body 800x800x1480mm Working Table 1340x850x740mm Total Weight 450Kg | Microscope Body 1000x1000x1730mm Working Table 1330x850x740mm Total Weight 550Kg |
| Optional Accessories | |||
| Optional Accessories | A50.7002 EDS Energy Dispersive X-Ray Spectrometer A50.7011 Ion Sputtering Coater | A50.7001BSE Back Scattering Electron Detector A50.7002 EDS Energy Dispersive X-Ray Spectrometer A50.7011 Ion Sputtering Coater A50.7030 Motorize Control Panel | A50.7001BSE Back Scattering Electron Detector A50.7002 EDS Energy Dispersive X-Ray Spectrometer A50.7011 Ion Sputtering Coater A50.7030 Motorize Control Panel |
| A50.7001 | BSE Detector | Semiconductor Four Segment Back Scattering Detector; Available In Ingredients A+B, Morphology Info A-B; Available Sample Observe Without Sputtering Gold; Available In Observe Impurity And Distribution From Grayscale Map Directly. |
| A50.7002 | EDS (X Ray Detector) | Silicon Nitride (Si3N4) Window To Optimize Low Energy X-ray Transmission For Light Element Analysis; Excellent Resolution And Their Advanced Low-noise Electronics Provide Outstanding Throughput Performance; The Small Footprint Offers Flexibility To Ensure Ideal Geometry And Aata Collection Conditions; The Detectors Contain A 30mm2 Chip. |
| A50.7003 | EBSD (Electron Beam Backscattered Diffraction) | user could analysis crystal orientation, crystal phase and micro texture of materials and related materials performance,etc. automatic optimization of EBSD camera settings during the data collection, do interactive real-time analysis to obtain maximum information all the data were branded with time tag, which can be viewed at any time high resolution 1392 x 1040 x 12 Scanning and index speed: 198 points / sec, with Ni as the standard, under the condition of 2~5nA, it can ensure the index rate ≥99%; works well under the condition of low beam current and low voltage of 5kV at 100pA orientation measuring accuracy: Better than 0.1 degrees Using triplex index system: no need rely on single band definition , easy indexing of poor pattern quality dedicated database: EBSD special database obtained by electron diffraction: >400 phase structure Index ability: it can automatically index all crystal materials of 7 crystal systems. The advanced options include calculating elastic stiffness (Elastic Stiffness), Taylor (Taylor) factor, Schmidt (Schmid) factor and so on. |
| A50.7010 | Coating Machine | Glass Protecting Shell: ∮250mm; 340mm High; Glass Processing Chamber: ∮88mm; 140mm High, ∮88mm; 57mm High; Specimen Stage Size: ∮40mm (max); Vacuum System:molecula Pump And Mechanical Pump; Vacuum Detection: Pirani Gage; Vacuum:better Than 2 X 10-3 Pa; Vacuum Protection:20 Pa With Microscale Inflation Valve; Specimen Movement: Plane Rotation,tilt Precession. |
| A50.7011 | Ion Sputtering Coater | Glass Processing Chamber: ∮100mm; 130mm High; Specimen Stage Size: ∮40mm( Hold 6 Specimen Cups) ; Golden Target Size: ∮58mm*0.12mm(thickness); Vacuum Detection: Pirani Gage; Vacuum Protection:20 Pa With Microscale Inflation Valve; Medium Gas:argon Or Air With Argon Gas Special Air Inlet And Gas Regulating In Microscale. |
| A50.7012 | Argon Ion Sputtering Coater | The Sample Was Plated With Carbon And Gold Under High Vacuum; Rotatable Sample Table, Uniform Coating, Particle Size About 3-5nm; No Selection Of Target Material, No Damage To Samples; The Functions Of Ion Cleaning And Ion Thinning Can Be Realized. |
| A50.7013 | Critical Point Dryer | Inner Diameter: 82mm, Inner Length: 82mm; Pressure Range:0-2000psi; Temperature Range:0°-50° C (32°-122° F) |
| A50.7014 | Electron Beam Lithography | Based On Scanning Electron Microscope, A Novel Nano-exposure System Was Developed; The Modificaton Has Kept All The Sem Functions For Making Nanoscale Line Width Image; The Modificated Ebl System Widly Applied Into Microelectronic Devices, Optoelectronic Devices, Quantun Devices, Microelectronics System R&d. |
| A63.7080, A63.7081 Standard Consumables Outfit | |||
| 1 | Field Emission Filament | Installed In Microscope | 1 Pc |
| 2 | Sample Cup | Dia.13mm | 5 Pcs |
| 3 | Sample Cup | Dia.32mm | 5 Pcs |
| 4 | Carbon Double-sided Conductive Tape | 6mm | 1 Package |
| 5 | Vacuum Grease | 10 Pcs | |
| 6 | Hairless Cloth | 1 Tube | |
| 7 | Polishing Paste | 1 Pc | |
| 8 | Sample Box | 2 Bags | |
| 9 | Cotton Swab | 1 Pc | |
| 10 | Oil Mist Filter | 1 Pc | |
| A63.7080, A63.7081 Standard Tools & Parts Outfit | |||
| 1 | Inner Hexagon Spanner | 1.5mm~10mm | 1 Set |
| 2 | Tweezers | Length 100-120mm | 1 Pc |
| 3 | Slotted Screwdriver | 2*50mm, 2*125mm | 2 Pcs |
| 4 | Cross Screwdriver | 2*125mmm | 1 Pc |
| 5 | Clean vent pipe | Dia.10/6.5mm(Out Diameter/Inner Diameter) | 5m |
| 6 | Vent pressure reducing valve | Output Pressure 0-0.6MPa | 1 Pc |
| 7 | Internal baking power supply | 0-3A DC | 2 Pcs |
| 8 | UPS power supply | 10kVA | 2 Pcs |
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